Featured Articles

5th Generation Broadwell 14nm family comes in three lines

5th Generation Broadwell 14nm family comes in three lines

Intel's 5th Core processor family, codenamed Broadwell, will launch in three lines for the mobile segment. We are talking about upcoming…

More...
Broadwell Chromebooks coming in late Q1 2015

Broadwell Chromebooks coming in late Q1 2015

Google's Chromebook OS should be updating automatically every six weeks, but Intel doesn't come close with its hardware refresh schedule.

More...
New round of Nexus phone rumour kicks off

New round of Nexus phone rumour kicks off

Rumours involving upcoming Nexus devices are nothing uncommon, but this year there is a fair bit of confusion, especially on the…

More...
Nvidia officially launches the 8-inch Shield Tablet

Nvidia officially launches the 8-inch Shield Tablet

As expected and reported earlier, Nvidia has now officially announced its newest Shield device, the new 8-inch Shield Tablet. While the…

More...
Aerocool Dead Silence reviewed

Aerocool Dead Silence reviewed

Aerocool is well known for its gamer cases with aggressive styling. However, the Dead Silence chassis offers consumers a new choice,…

More...
Frontpage Slideshow | Copyright © 2006-2010 orks, a business unit of Nuevvo Webware Ltd.
Tuesday, 01 March 2011 10:21

Intel about to miss the boat on EUV

Written by Nick Farell
intel_logo_new

Delays drag on
An important milestone in the development of Extreme ultraviolet (EUV) lithography is in danger of missed by Intel.

Under its current roadmap Chipzilla needed to extend 193-nm immersion lithography to the 14-nm logic node in the second half of 2013. Then, the chip giant hopes to insert EUV for production at the 10-nm logic node, which is expected to appear in the second half of 2015.

According to EE Times EUV is late for the 10-nm design rule definition’’ stage. Quoting Sam Sivakumar, director of lithography at Intel, EUV still stands a good chance of being inserted for the company’s 10-nm node if production-worthy tools are shipped by the second half of 2012. But even then EUV will be at the ''late end of the spectrum.”

EUV is a next-generation lithography (NGL) technology that was supposed to be used for production at the 65-nm node. It was delayed, due to the lack of power sources, defect free masks, resists and metrology infrastructure.
Chip makers want the technology for production fabs, in an effort to avoid double-patterning techniques which are somewhat expensive.

EUV is now only likely to be seen at when production technology hits 16-nm node.


blog comments powered by Disqus

 

Facebook activity

Latest Commented Articles

Recent Comments